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半导体专业名词缩写表

半导体专业名词缩写表
半导体专业名词缩写表

A/D analog to digital

AA atomic absorption

AAS atomic absorption spectroscopy

ABC activity‐based costing

ABM activity‐based management

AC alternating current; activated carbon

ACF anisotropic conductive film

ACI after‐clean inspection

ACP anisotropic conductive paste

ACT alternative control techniques; actual cycle time

ADC analog‐to‐digital converter

ADE advanced development environment

ADI after‐develop inspection

ADT applied diagnostic technique

ADTSEM Apply/Develop Track Specific Equipment Model

AE atomic emission; acousticemission; absolute ellipsometry AEC advanced equipment controller

AECS Advanced Equipment ControlSystem; Automated Equipment Control System

AEI after‐etch inspection; automated equipment interface AEM analytical electron microscopy

AES Auger emission/electron spectroscopy

AFM atomic force microscopy

AFP abrasive‐free polish

Ag silver

A‐GEMTF Advanced GEM Task Force

AGV automated guided vehicle

AHF anhydrous hydrogen fluoride

AHU air handling unit

AIR automated image retrieval

Al aluminum

ALD atomic layer deposition

ALE atomic layer epitaxy; application logic element

ALS advanced light source; advanced low‐power Schottky AMC airborne molecular contamination

AMHS automated material handling system

AMT advanced manufacturing technology

AMU atomic mass unit

ANN artificial neural network

ANOVA analysis of variance

AOV air‐operated valve

AP adhesion promoter

APA advanced performance algorithm

APC advanced process control

APCD add‐on pollution control device

APCFI Advanced Process Control Framework Initiative APCVD atmospheric pressure chemical vapor deposition APEC advanced process equipment control

API application programming interface; atmospheric pressure ionization

APM atmospheric passivation module; acoustic plate mode APRDL Advanced Products Research and Development Laboratory aPSM attenuating phase‐shift mask

AQI ACCESS query interface

AQL acceptable quality level

Ar argon

AR aspect ratio

ARAMS Automated Reliability

ARC antireflective coating

ARDE aspect ratio‐dependent etching

ARPA Advanced Research Projects Agency (see DARPA)

ARS angle‐resolved scattering

As arsenic

AS/RS automated storage and retrieval system

ASAP Advanced Stepper Application Program

ASIC application‐specific integrated circuit

ASO automatic shutoff

ASP advanced strip and passivation; advanced strip processor ASR automated send receive

ATDF Advanced ToolDevelopment Facility

ATE automatic test equipment

ATG automatic test generation

ATLAS abbreviated test language for all systems

atm atmosphere

ATP advanced technology program; adenosine triphosphate; acceptance and tool performance

ATR attenuated total reflectance

Att attenuated

Au gold

AVP advanced vertical processor

AVS advanced visualization system

AWE asymptotic waveform evaluation AWISPM above wafer in situ particle monitoring AWS advanced wet station

B billion; boron

Ba barium

BARC bottom antireflective coating

BASE Boston Area Semiconductor Education (Council)

BAW bulk acoustic wave

BC bias contrast

BDEV behavior‐level deviation

BDS Brownian Dynamics Simulation

Be beryllium

BEOL back end of line

BESOI bonded and etchback silicon on insulator

BF brightfield

BFGS Broyden‐Fletcher‐ Goldfarb‐Shanno optimization algorithm BFL buffered field‐effect transistor logic

BGA ball grid array

BHT Brinell hardness test

Bi bismuth

BiCMOS bipolar complementary metal‐oxide semiconductor BIFET bipolar field‐effect transistor

BIM binary intensity mask

BiMOS bipolar metal‐oxide semiconductor

BIST built‐in self‐test

BIT bulk ion temperature

BITE built‐in test equipment

BMC bubble memory controller

BMD bulk micro defect

BOE buffered oxide etchant

BOR bottom of range

BOSS Book of SEMI Standards; binary object storage system BOX buried oxide

BPR beam profile reflectometry; business process reengineering BPSG boron phosphosilicate glass

BPTEOS BPSG from a TEOS source

Br bromine

BSE backscattered electron detection

BTAB bumped tape automated bonding

BV breakdown voltage

C carbon

Ca calcium

CA CIM architecture

CAA CIM applications architecture

CAB Competitive Analysis Benchmarking

CAD computer‐aided design

CADT control application development tool

CAE computer‐aided engineering

CAI computer‐assisted instruction

CAM computer‐aided manufacturing

CAPS computer‐assisted problem solving

CAR chemically amplified resist

CARRI Computerized Assessment of Relative Risk Impacts

CASE computer‐aided softwareengineering; computer‐aided systems engineering

CAT computer‐aided testing

CAW Construction Analysis Workgroup CAWC cryogenic aerosol wafer cleaning CBGA ceramic ball grid array

CBS chemical bottle storage area

CBT computer‐based training

CC chip carrier; cluster controller CCC ceramic chip carrier

CCD charge‐coupled device

CCSL compatible current‐sinking logic CCW counterclockwise

Cd cadmium

CD critical dimension

CD/OL critical dimension overlay

CDA clean dry air

CDE chemical downstream etch

CDEM Customer Delivery Enterprise Model CDI collector‐diffusion isolation

CDM Common Device Model for SAB CDO controlled decomposition/oxidation CDR chemical distribution room

CDS chemical distribution system

Ce cerium

CE capillary electrophoresis

CEC cell evaluation chip

CEE control execution environment CEM continuous emissions monitoring CER‐DIP ceramic dual in‐line package

CFA component failure analysis

CFC chlorofluorocarbon

CFD computational fluid dynamics

CFM contamination‐free manufacturing CIC cleanroom interface chamber

CID charge‐injection device

CIE computer‐integrated engineering CIM computer‐integrated manufacturing

CIM‐OSA computer‐integrated manufacturing‐open systems architecture (ESPRIT program)

CIP Continuous Improvement Program

CIS Center for Integrated Systems

CISC complex instruction set computer

Cl chlorine

CLCC ceramic leaded chip carrier

CLIC closed‐loop intensity control

CM configuration management; cassette module

CMC cassette module controller

CML current mode logic

CMM capability maturity model

CMOS complementary metal‐oxide semiconductor

CMP chemical mechanical planarization

CMR common‐mode rejection ratio; cancel move request

CNC computer numerical control; condensation nucleus counter CNT carbon nanotube

Co cobalt

COB chip‐on‐board

COC cost of consumables

CODEC coder‐decoder

COED computer‐optimized experimental design

COGS cost of goods sold

CoO cost of ownership

CORBA common object request broker architecture

CORE composite object reference

COSS common object services specification

COT customer‐owned tooling

CoV coefficient of variance

Cp process capability

CPD concurrent product development

CPE Communications

CPGA ceramic pin grid array

Cpk process capability index

CQFP ceramic quad flat pack

CQN closed‐queuing network

Cr chromium

CRC cyclic redundancy check CRM Cost/Resource Model

Cs cesium

CSA CIM systems architecture CSE control systems engineering CSF critical success factor

CSL current‐steering logic CSMA/CD carrier‐sense

CSP chip‐scale package

CSPED concurrent semiconductor production and equipment development

CST CIM systems technology

CSTR continuously stirred tank reactor

CSV comma‐separated variable

CTC cluster tool controller

CTE coefficient of thermal expansion

CTI cycle time improvement

CTMC cluster tool modular communications

Cu copper

CUB central utility building

CUBES capacity utilization bottleneck efficiency system

CUI common user interface

CUSUM cumulative sum

CV capacitance‐to‐voltage

CVCM collected volatile condensable materials

CVD chemical vapor deposition

CW continuous wave

Cz Czochralski process

D/A digital to analog

D/B die bonding

DAC digital‐to‐analog converter

DAS direct absorption spectroscopy

DASSL differential algebraic system solver

DBMS database management system

DC direct current

DCA direct chip attachment

DCATS double‐contained acid transfer system

DCE distributed computer environment

DCL digital command language; display communication log DCS dichlorosilane

DDL device description language

DDMS defect data management system

DEDS discrete‐event dynamic simulation

DES data encryption standard; display equipment status

DF darkfield

DFC densified fluid clean

DFE dual‐frequency etch

DFM design for manufacturing

DFR design for reliability

DFT design for test

DFY design for yield

DHF dilute hydrofluoric acid

DI deionized; dielectric isolation

DIBL drain‐induced barrier leakage

DIC differential interference contrast

DIL dual in‐line

DIP dual in‐line package

DLBI device‐level burn‐in

DLOC developed source lines of code

DLS display lot status

DLT device‐level test

DLTS deep‐level transient spectroscopy

DMA direct memory access; dynamic mechanical analysis

DMH display message helps

DML data manipulation language; display message log

DMM digital multimeter

DMOS diffused metal‐oxide semiconductor

DMR display move requests

DO dynamic optimization

DOA dead‐on alignment

DOAS differential optical absorption spectroscopy

DOE design of experiments

DOF depth of focus

DOP dioctylphthalate

DPA destructive physical analysis

DPM digital panel meter

DPP discharge‐produced plasma

DPSRAM dual‐port static random access memory

DRAM dynamic random access memory

DRAPAC Design Rule and Process Architecture Council

DRC design rule check

DRE destruction removal efficiency

DRIFTS diffuse reflectance infrared Fourier transform spectroscopy

DRT defect review tool

DSA display system activity; dimensionally stable anode DSC differential scanning calorimetry

DSMC direct simulation Monte Carlo

DSQ downstream quartz

DSS display stocker status

DSW direct step‐on‐wafer

DT dynamic test

DTA differential thermal analysis

DTC direct thermocouple control

DTL diode transistor logic

DTM defect test monitor; delay time multiplier; device test module; digital terrain map

DTMPN defect test monitor phase number

DUT device under test

DUV deep ultraviolet

DV design verification

DVER design rule verification

DVM digital voltmeter

DVS display vehicle status

DWG domain work group

EAPSM embedded attenuated phase‐shift mask EAROM electrically alterable read‐only memory EASE equipment and software emulator

e‐beam electron beam

EBHT electron‐beam high‐throughput lithography EBIC electron beam‐induced current

EBR edge bead removal

EC engineering change; equipment controller ECA engineering capability assessment

ECAD electronic computer‐aided design; engineering computer‐aided design

ECAE electronic computer‐aided engineering ECL emitter coupled logic

ECN engineering change notice

ECO engineering change order

ECQB electrochemical quartz crystal balance ECR electron cyclotron resonance

EDA electronic design automation

EDS energy‐dispersive spectroscopy

EDU equipment‐dependent uptime

EDX energy‐dispersive X‐ray

EDXA energy‐dispersive X‐ray analysis

EEDF electron energy distribution function

EELS electron energy‐loss spectroscopy

EEPROM electrically erasable programmable read‐only memory EFEM equipment front‐end module

EFOCS evanescent fiber‐optic chemical sensor

EFTIR emission Fourier transform infrared spectroscopy EFV excess flow valve

EGE ethylene glycol ethers

EHS extremely hazardous substance

EI equipment integration

EID Equipment InterfaceDevelopment

EIP Equipment Improvement Program; Equipment Improvement Project

EIS electrochemical impedance spectroscopy

EKF extended Kalman filter

ELF extremely low frequency

EM enterprise model; electromagnetic; electromigration EMA equipment maturity assessment

EMC electromagnetic capability; electromagnetic compatability EMF electromagnetic field

EMG electromigration

EMI electromagnetic interference

EMMA electron microscopy and microanalysis

EMP electromagnetic pulse

EMR enter move request

EMU electromagnetic unit

EOS electrical overstress

EOT end of transfer; equivalent oxide thickness

EP extreme pressure; electropolish

EPL electron projection lithography

EPR electron paramagnetic resonance

EPROM electrically programmable read‐only memory

EPSS electronic performance support system

EPT equipment performance tracking

EQUIP C/I equipment control and integration

EQUIP RTC equipment real‐time control

ERAM equipment reliability

ERM enterprise reference model

ERN external recurrent neural network

ERP extended range pyrometer

ERS event reporting standard

ERT emergency response time

ES engineering specification; expert system

ESC electrostatic chuck

ESCA electron spectroscopy for chemical analysis

ESD electrostatic discharge

ESH environment

ESM electronic service manual

ETAB Executive Technical Advisory Board

ETQR External Total Quality and Reliability

EUV extreme ultraviolet

eV electron volt

EWMA exponentially weighted moving average

F fluorine

F/I final inspection

FA failure analysis

FAB fast atom bombardment

FAMOS floating‐gate avalanche‐injection metal‐oxide semiconductor FBGA fine‐pitch ball grid array

FC flip chip

FCM facilities cost model

FCS factory control system

FDC fault detection and classification

FDE frequency domain experiments

FDSOI fully depleted silicon on insulator

Fe iron

FEC fabrication evaluation chip

FEM finite element model

FEOL front end of line

FESEM field emission scanning electron microscopy

FET field‐effect transistor

FFT fast Fourier transform

FFU filter fan unit

FI filterability index; factory integration

FIB focused ion beam

FID flame ionization detector

FIFO first‐in

FIMS front‐opening interface mechanical standard

FL fuzzy logic

FLOPC floating point operations needed per cycle

FLOTOX floating gate tunnel oxide

FLRT factory layout/relayout tool

FM foreign material

FMEA failure mode and effects analysis

FMMC factory material movement component

FMVP Framework Member Validation Project

FNN feed‐forward neural network

FOCS fiber‐optic chemical sensor

FOSB front opening shipping box

FOUP front opening unified pod

FOV field of view

FOX field oxide

FP flash point

FPD focal plane deviation; flat panel display

FPGA field‐programmable gate array

FPLA field‐programmable logic array

FPLF field‐programmable logic family

FPLS field‐programmable logic switch

FPMS Factory Performance Modeling Software FPROM field‐programmable read‐only memory FRACAS Failure Reporting

FRAME Failure Rate Analysis and Modeling

FRMB fast ramp mini batch

FSG fused silica glass

FSM finite state machine

FT final test; Fourier transform

FTA fault tree analysis

FTAB Focus Technical Advisory Board

FTIR Fourier transform infrared

FW full wave

FWHM full‐width half‐maximum

FZ float zone

Ga gallium

GAC granular activated carbon

GC gas chromatography; gravimetric calibrator

GCC generic cell controller

GCD gas chromatography distillation

GCMS gas chromatography mass spectroscopy

GDPP gas drive plasma pinch

GDS graphical design system; graphical design software Ge germanium

GEM Generic EquipmentModel

GEMVS GEM verification system

GES generic equipment simulator

GFC gas filter correlation

GFCI ground fault circuit interrupter

GIDL gate‐induced drain leakage

GILD gas immersion laser doping

GLC gas liquid chromatography

GOI gate oxide integrity

GPIB general‐purpose interface bus

GSCE gas source control equipment

GTS GEM Test System

H hydrogen

HAP hazardous air pollutant

HARI high aspect ratio inspection

HAST highly accelerated stress testing HAZCOM Hazard Communication Standard

HB horizontal Bridgeman crystal

HCI hot carrier injection

HCM hollow cathode magnetron

HCMOS high‐density CMOS

HCS hot‐carrier suppressed

HD high density

HDL hardware description language

HDP high‐density plasma

HDPE high‐density polyethylene

He helium

HEM high‐efficiency matching

HEPA high‐efficiency particulate air

Hf hafnium

HF hydrofluoric acid

Hg mercury

HIBS heavy ion backscattering spectrometry HiPOx high‐pressure oxygen

HLF horizontal laminar flow

HMDS hexamethyldisilizane

HMIS hazardous materials inventory statement HMMP hazardous materials management plan HMOS high‐performance MOS; high‐density MOS HOMER hazardous organic mass emission rate HOPG highly oriented pyrolitic graphite

HP high purity

HPEM Hybrid Plasma Equipment Model

HPI high pressure isolation

HPL high‐performance logic

HPLC high‐performance liquid chromatography

HPM hazardous production materials; high‐purity metal

HPV high‐pressure vent

HRA human reliability analysis

HRR high ramp rate

HRTEM high‐resolution transmission electron microscopy

HSQ hydrogen silsesquioxane

HTO high‐temperature oxidation

HTRB high‐temperature reverse bias

HUPW hot ultrapure water

HVAC heating

I iodine

I/O input/output

I2L integrated injector logic

I300I International 300 mm Initiative

IC integrated circuit; Investment Council; ion chromatography ICAP inductively coupled argon‐plasma spectrometry

ICMS integrated circuit measurement system

ICP inductively coupled plasma

ICP‐AES inductively coupled plasma atomic emission spectroscopy ICP‐MS inductively coupled plasma mass spectrometry

ICT ideal cycle time

IDDQ direct drain quiescent current

IDEAL initiating

IDL interface definition language

IDLH immediately dangerous to life or health

IDS interactive diagnostic system

IEA ion energy analysis

IEC infused emitter coupling

IEDF ion energy distribution function

IERN internal‐external recurrent neural network

IF interface

IGFET insulated‐gate field‐effect transistor

ILB inner lead bond

ILD interlevel dielectric; interlayer dielectric

ILS intracavity laser spectroscopy

IM integrated model; integrated metrology

IMD intermetal dielectric

IMMA ion microphobe mass analysis

IMS ion mobility spectroscopy

In indium

INCAMS individual cassette manufacturing system

IPA isopropyl alcohol

IPL ion projection lithography

IPT ideal process time

Ir iridium

IR infrared

IRAS infrared reflection‐absorption spectroscopy IRIS imaging of radicals interacting with surfaces IRN internal recurrent neural network IRONMAN Improving Reliability of New Machines at Night IRTC‐1interconnect reliability test chip‐1

IS information systems; interface specifications; integrated systems

ISC Industry Steering Council

ISEM inspection/review specific equipment model ISM inductor super magnetron

ISMT International SEMATECH

ISPM in situ particle monitor

ISR in situ rinse

ISS ion scattering spectroscopy

ITRI Interconnection Technology

ITRS International Technology

IVH interstitial via hole

IVP integrated vacuum processing

JDP Joint Development Program

JEDEC Joint Electron Device Engineering Council JESSI Joint European Submicron Silicon Initiative

JIC Joint Industrial Council

JIT just‐in‐time

JJT Josephson junction transistor

JVD jet vapor deposition

K potassium; thousand

keV kilo electron volt

KPA key process area

Kr krypton

kV kilovolt

La lanthanum

LAMMA laser micro‐mass analysis

LAMMS laser micro‐mass spectroscopy

LC inductance‐capacitance; liquid chromatography

LCA lifecycle analysis

LCC leaded chip carrier

LCL lower confidence limit

LDD lightly doped drain

LDL lower detection limit

LDP low‐density plasma

LDPE low‐density polyethylene

LEC liquid encapsulated Czochralski crystal LEL lower explosive limit

LER line edge roughness

LF laminar flow

LFL lower flammable limit

LGQ linear Gaussian quadratic

Li lithium

LI laser interferometry

LIC linear integrated circuit

LID leadless inverted device

LIFO last in

LIMA laser‐induced mass analysis

LIMS laser‐induced mass spectrometry LLCC leadless chip carrier

LLD lower limit of detection

LLNQ least lots next queue

LM light microscope

LMMA laser microprobe mass analysis LOCOS local oxidation of silicon

LOS loss of selectivity

LPC linear predictive coding; laser particle counter; low particle concentration; liquid‐borne particle counter

LPCVD low‐pressure chemical vapor deposition LPD light point defect

LPE liquid phase epitaxy

LPI low‐pressure isolation

LPP laser‐produced plasma

LRS laser Raman spectroscopy

LSE latex sphere equivalent

LSHI large‐scale hybrid integration

LSI large‐scale integration

LSM laser scanning microscope

LTA laser thermal anneal

LTCVD low‐temperature chemical vapor deposition LTO low‐temperature oxidation/oxide

LTPD lot tolerance percent defective

LTV local thickness variation

LV latent variable

LVDT linear voltage differential transducer

LVI low‐voltage inverter

LVS layout verification of schematic

LWR linewidth reduction

LWS large wafer study

M million; mega

MACT maximum achievable control technology

MALDI matrix‐assisted laser desorption and ionization MAN metropolitan area network

Management Standard

Manufacturing and Science

MAP manufacturing automation protocol

Master Deliverables List

MAWP maximum allowable working pressure

MB machine batch

MBC machine bath collection

MBE molecular beam epitaxy

MBPC model‐based process control

MBTC model‐based temperature control

MCBA mean cycles between assists

MCBF mean cycles between failures

MCBI mean cycles between interrupts

MCM multichip module; manufacturing cycle management MCP master control processor;multichip package

MCS material control system

MCU microprocessor control unit; mobile calibration unit MCVD metal chemical vapor deposition

MDL minimum detection limit;

MD‐MOS multi‐drain metal‐oxide semiconductor

MDQ market‐driven quality

MEBS medium energy backscattering spectrometry MEEF mask error enhancement factor

MEMS microelectromechanical system

MERIE magnetically enhanced reactive ion etching

MES manufacturing execution systems

MESFET metal‐semiconductor field‐effect transistor

METS Materials and Equipment Trading Service

MeV mega electron volt

MFC mass flow controller

MFM mass flow meter

Mg magnesium

MG manufactured goods

MHI material hazard index

MHz megahertz

MIC monolithic integrated circuit

MID material ID

MIE magnetron ion etching

MIM metal‐insulator‐metal

MIS metal insulator silicon

MLCC multilayer ceramic capacitor

MLL modify lot location

MLM multilevel metal

MLR message log report

MMC Manufacturing Methods Council

MMD Microlithographic Mask Development program

MMIC monolithic microwave integrated circuit

MMM material movement management

MMMS Material Movement

MMO multimodel optimization

MMOS modified MOS

MMST Microelectronics Manufacturing Science and Technology Mn manganese

MNOS metal‐nitride‐oxide semiconductor

MNS metal‐nitride semiconductor

Mo molybdenum

MO metal‐organic

MOCVD metal‐organic chemical vapor deposition

MOP modify operating procedures

MOS metal‐oxide semiconductor

MOS‐C metal‐oxide semiconductor capacitor

MOSFET metal‐oxide semiconductor field‐effect transistor mp melting point

MP massively parallel

MP‐OES multipoint optical emission spectroscopy MPRES modular plasma reactor simulator MPU microprocessor unit

MRP materials requirements planning

MRP‐II manufacturing resource planning

MS mass spectrometry; mass spectroscopy MSDS Material Safety Data Sheet

MSEM Metrology Specific Equipment Model

MSG Management Steering Group

MSHA Mine Safety and Health Administration

MSI medium‐scale integration; manufacturing support item MSID mass spectrometer lead detector

MSLD mass spectrometer leak detector

MSTAB Manufacturing Systems Technical Advisory Board

MTBA mean time between assists

MTBF mean time between failures

MTBFp mean (productive) time between failures

MTBI mean time between interrupt; mean time between incident MTOL mean time off line; mean time on line

MTS Material Tracking Standard

MTTA mean time to assist

MTTF mean time to failure

MTTR mean time to repair

MV megavolt

MVTR moisture vapor transmission rate

MW molecular weight

MWBC mean wafers between cleans

MWT monitor wafer turner

N nitrogen

Na sodium

NA numerical aperture

NCMS National Center for

NCS Network Communication Standard

NDA nondisclosure agreement

NDE nondestructive evaluation

NDIR nondispersive infrared spectroscopy

NDP neutron depth profiling

NDT nondestructive testing

NDUV nondispersive ultraviolet spectroscopy

NEC National Electric Code

NESHAP National Emissions Standards for Hazardous Air Pollutants NFOM near‐field optical microscopy

NGL next‐generation lithography

Ni nickel

NIL nanoimprint lithography

NIRA near‐infrared reflection analysis

NMOS negative channel metal‐oxidesemiconductor

NMR nuclear magnetic resonance

NN neural network

NRE nonrecurring engineering

NTRS National Technology Roadmap for Semiconductors NTU nephelometric turbidity unit

NVR non‐volatile residue

O oxygen

OBA object behavior analysis

OBEM Object‐Based Equipment Model

OBIC optical beam‐induced current

OBL object‐based language

OC open cassette

OCR optical character recognition

OD outside diameter

ODS ozone‐depleting substances

OEE overall equipment effectiveness

OEM original equipment manufacturer

OES optical emission spectroscopy

OHT overhead transport; overhead hoist transport OHV overhead vehicle

OL overlay

OLB outer lead bond

OLE object linking and embedding

OM operational modeling; optical microscopy

OMA object management architecture

OMS optical mass spectroscopy

OMT object modeling technique

OO object‐oriented

OOA object‐oriented analysis

OOD object‐oriented design

OODB object‐oriented database

OODBMS object‐oriented database management system OOP object‐oriented programming

OPC optical particle counter; optical proximity correction OS operating system

OSD organic spin‐on dielectric

OSF Open Systems Foundation

OSG organosilicate glass

OSI open system interconnection

OSRM Office of Standard Reference Materials

OSS Object Services Standard

Ox oxide

P phosphorous

P/T precision‐tolerance

PAB post‐apply bake

PAC photoactive compound

PACVD plasma‐assisted chemical vapor deposition

PA‐FTIR photoacousticFourier transform infrared spectroscopy PAG photoacid generator

PAL process automation language; programmable array logic; process asset library

PAM process application module

PAS photoacoustic spectroscopy

PAWS portable acoustic wave sensor

Pb lead

PBET Performance‐Based Equipment Training PBGA plastic ball grid array

PBL poly‐buffered LOCOS

PBS photon backscattering

PC personal computer; programmable controller; process control

PCAD packaging computer‐aided design

PCB printed circuit board

PCMP post‐chemical mechanical polishing

PCMS plasma chemistry Monte‐Carlo simulation PCO photocatalytic oxidation

PCR principle component regression

PCT process change team

Pd palladium

PDC passive data collection

PDF portable document format

PDSOI partially depleted silicon on insulator

PDU protocol data unit

PDVC phase‐dependent voltage contrast

PEB post‐exposure bake

PECVD plasma‐enhanced chemical vapor deposition PED post‐exposure delay

PEDS plasma‐enhanced deposition system PEELS parallel electron energy loss spectrometry PEL permissible exposure level

PES photoelectron spectroscopy

PET post‐etch treatment

PETEOS plasma‐enhancedtetraethylorthosilicate PFA perfluoroalkoxy

阿里系各个概念英文缩写名词解释大全

阿里系各个概念英文缩写名词解释大全!!! GMV成交笔数:拍下的订单笔数,包括未付款的。 GMV成交金额:拍下的订单总金额,包括未付款的。支付宝成交笔数:通过支付宝付款的订单笔数。 支付宝成交金额:通过支付宝付款的订单总金额(不是指确认收货完成了交易,仅指买家完成了付款的动作,因此可能会因为退款,这个数值比商家实际收到的款项高)。支付宝使用率:支付宝成交金额/GMV成交金额(珠宝66%,饰品82%) 支付宝使用率的辅助参数:支付宝笔数/GMV笔数(当支付宝使用率很低时,可用此参数看是否正常(80%以上)。因为采用限时折扣相关促销工具时,支付宝收到的款项是折扣价,销售记录中显示的是原价,会导致二者比率过低。)IPV:itemPageView,商品详情页面打开数。 IPV_UV:商品详情页面访客数。在线商品数:在线的商品数量(SKU)。

购买UV:通过支付宝付款的访客数。 店铺UV:到达店铺任何页面的独立访客数。 店铺PV:PageView,店铺所有页面的总打开数。 佣金:根据扣点百分比,和当日商家支付宝实际收到的金额实时划扣的佣金金额(确认收货后,卖家支付宝账户实际收到的款项为准)转化率1: IPV_UV/ 店铺UV(到达店铺的访客,有多少进入了商品详情页面。) 体现店铺首页、自定义页、分类页是否具备足够的导购能力。转化率2: 购买UV/ IPV_UV(到达商品详情页面的独立访客,有多少付款购买。)体现店铺单品页面图片、描述等是否能刺激购买。 店铺转化率:购买UV/店铺UV(转化率1*转化率2:到达店铺任意页面的访客,有多少付款购买。目前珠宝平均1.39%;饰品平均3.18%。)客单价:

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